In today’s semiconductor manufacturing world of shrinking line geometries, it is critical to use water of the highest purity to limit damaging defects. Thousands of liters of ultrapure water (UPW) are used to wash and process a single wafer. Any dissolved impurities that remain on the wafer’s surface after washing can cause defects in the resulting semiconductor devices. The Nonvolatile Residue Monitor (NRM), Fluid Measurement Technology’s original flagship product, was designed to address this problem. Unique at the time it was invented, it has been sold throughout the world.
The NRM is an industry standard for the reliable measurement of dissolved inorganic or colloidal silica impurities in UPW systems for the microelectronics industry. The NRM detects contaminants that other detectors such as TOC monitors, particle counters, and on-line reactive silica monitors do not detect. The NRM is frequently the first instrument to indicate water quality degradation and as such can offer a distinct competitive advantage. The NRM is the only available instrument meeting the ASTM Standard D5544-05, “Standard Test Method for On-Line Measurement of Residue After Evaporation of High Purity Water.”