STPC3 9010-03 Plus

Scanning Threshold Particle Counter 3 Plus  

Reliable detection of nanoscale contaminants that lead to wafer defects

Measure below optical particle counters (OPC) size detection limits.

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Why Choose the STPC 3+?

If you're operating in high-purity environments where every nanometer counts, the STPC3+ offers unmatched sensitivity, chemical compatibility, and confidence in your contamination monitoring.

The STPC3 Plus is a state-of-the-art nanoparticle detection system designed for continuous, real-time monitoring of ultrapure liquids used in high-precision industries. It pushes beyond the limitations of traditional Optical Particle Counters (OPCs), detecting both particles and particle precursors at threshold sizes as small as 3 nanometers—ideal for preventing costly wafer defects in semiconductor manufacturing and beyond.

Whether it’s ultrapure water or critical process chemicals, the STPC3+ ensures your fluid systems are free from the nanoscale contaminants that traditional tools miss.

Key Features:

  • Advanced Sensitivity
    Detect particles as small as 5 nm with unparalleled accuracy, making it ideal for applications requiring ultra-fine aerosol measurement.
  • High Throughput
    Achieve rapid scanning and robust data output without sacrificing precision, ensuring efficiency even in demanding environments.
  • Real-Time Monitoring
    Stay ahead with live particle size distribution and concentration updates to meet regulatory and operational needs.
  • Versatile Applications
    Perfect for cleanrooms, semiconductor manufacturing, pharmaceutical production, and other controlled environments.
  • Intuitive Interface
    A user-friendly touchscreen display and seamless software integration simplify operation, data management, and reporting.
  • Ultra-sensitive detection below optical particle counter limits
  • Threshold sizes: 3, 9, 15 nm (user configurable)

Applications:

  • Semiconductor manufacturing
  • Ultrapure water system validation
  • Ion exchange resin quality monitoring
  • Chemical process control
  • Excursion event detection
  • Nanoparticle and precursor research



Measure below the Optical Particle Counter Detection Limit!


STPC3 Measures both Residue (Particle Precursors) and Native Particles.


Monitor UPW and Dilute solvents (IPA, H2O2, Ammonia, HCl).


Meets SEMI standards C79, C93, F121

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