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Development and Evaluation of a 3 nm Ultrapure Liquid Quality Monitor
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Scanning Threshold Particle Counter 3 Model 9010-03: User Manual
If you're operating in high-purity environments where every nanometer counts, the STPC3+ offers unmatched sensitivity, chemical compatibility, and confidence in your contamination monitoring.
The STPC3 Plus is a state-of-the-art nanoparticle detection system designed for continuous, real-time monitoring of ultrapure liquids used in high-precision industries. It pushes beyond the limitations of traditional Optical Particle Counters (OPCs), detecting both particles and particle precursors at threshold sizes as small as 3 nanometers—ideal for preventing costly wafer defects in semiconductor manufacturing and beyond.
Whether it’s ultrapure water or critical process chemicals, the STPC3+ ensures your fluid systems are free from the nanoscale contaminants that traditional tools miss.
Measure below the Optical Particle Counter Detection Limit!
STPC3 Measures both Residue (Particle Precursors) and Native Particles.
Monitor UPW and Dilute solvents (IPA, H2O2, Ammonia, HCl).
Meets SEMI standards C79, C93, F121
The STPC3+ receives a sample of ultrapure water (UPW) or process chemical either:
The instrument uses a proprietary nebulization process to convert the liquid into an aerosol. This step:
This process is key to simulating real-world defect behavior from liquid contamination.
Once the aerosol is formed:
This allows detection of both actual particles and particle precursors (non-volatile residues) that OPCs (optical particle counters) cannot measure.
The system is configured to detect particles at 3, 9, or 15 nanometers, using a selectable threshold approach.
The results are:
Category | STPC3 9010-03 | STPC 9010 | PMS Ultra DI® 20 |
---|---|---|---|
Size channels [nm] | 3, 9, 15 | 10, 15, 20 | 20, 50, 70, 100 |
Operating principle | Nebulization + condensation particle counting | Nebulization + condensation particle counting | Light scattering in liquid, mapped to a particle concentration |
Allowed liquids | UPW, IPA, Peroxide, Ammonia | UPW | UPW |
Native Particles? | Yes | Yes | Yes |
NVR / Particle Precursors? | Yes | Yes | No |
Material dependent? | No | No | Yes |
Bubble interference? | No | No | Yes |
Talk to an industry engineer to find the right solution for your application.